1907-33-1
Lithium t-butoxide
叔丁醇锂

产品介绍９�/div>

Technical Notes:

1. ALD precursor for Li thin film deposition widely used in Li ion battery related applications

References:

1. J. Vac. Sci. Technol. A, 2020, 38, 060804.

2. Diamond Relat. Mater., 1997, 6, 494.

3. J. Electrochem. Soc. 2012, 159, A259.

4. J. Phys. Chem. C, 2014, 118, 27749.

5. ACS Nano, 2014, 8, 10963.

6. ACS Appl. Mater. Interfaces 2018, 10, 26972.

7. J. Vac. Sci. Technol. A, 2020, 38, 050401.

8. ACS Nano 2017, 11, 7019.

9. J. Phys. Chem. C, 2013, 117, 20260.

10. J. Electrochem. Soc. 2013, 160, A3066.

11. Adv. Mater. 2014, 26, 6472.

12. Chem. Mater. 2015, 27, 5324.

13. Chem. Mater. 2017, 29, 3785.

14. Phys. Chem. C, 2019, 123, 15802.