7440-47-3
Chromium sputtering target
铬溅射靶

产品介绍９�/div>

应用
Chromium sputtering target is commonly used for thin-film deposition, etching and analytical techniques. And It is also used as Magnetron sputtering source.

备注
Thickness tolerance: ^+0.015in; Diameter tolerance: +0.020/-0.0in

基本信息

MDL
MFCD00010944

EINECS
231-157-5

灵敏�?/strong>
Ambient temperatures.

溶解�?/strong>
Insoluble in water.

安全信息

TSCA
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