微纳加工化学 >> 刻蚀涱/div>
钛蚀刻剂TFTN
产品介绍
钛蚀刻剂是应用于半导体制作和薄膜微电子技术的选择性控制蚀刻剂
钛蚀刻剂TFTN用来蚀刻玻璃或SiO
2基板上的Ti沉积膜。TFTN不含氢氟酸、/div>
Titanium Etchant TFTN,Intended for etching Ti films deposited on glass or SiO2substrates. TFTN does not contain hydrofluoric acid.
钛蚀刻剂TFT设计用来蚀刻通常在微电子产品中作为连结层和阻挡层的蒸发法薄膜的蚀刻剂。这种蚀刻剂光刻胶匹配性良好、分辨率高、边下蚀现象低、div> Titanium Etchant TFT designed for etching evaporated films commonly employed as bonding and barrier layers in microelectronics. Excellent resolution, photo resist compatibility, and minimal undercutting are readily achieved.
*KPR/KMER/KTFR:PKP(Transene);AZ/RISTON/ETC.
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